Wallpaper Pattern Alignment along Garment Seams

publication
ACM SIGGRAPH 2019
authors
Katja Wolff, Olga Sorkine-Hornung

Wallpaper Pattern Alignment along Garment Seams

Our method supports the production of high quality textured garment designs by optimizing the continuity and symmetry properties of the texture across seams. Our input is a sewing pattern and the desired fabric texture, or a 2D wallpaper pattern (a). A random placement of the sewing pattern on the fabric is likely to result in obvious misalignment of the texture on the seams, which is visually displeasing (b). Our method computes an optimal placement, such that misalignments of the repetitive wallpaper pattern are minimized (c). For most garment shapes, it is impossible to achieve a perfectly seamless appearance without changing the shape of the sewing pattern itself. Therefore we additionally provide the option to slightly alter the sewing pattern shape to obtain a much better texture fit along the seams (d). The improved visual appearance is noticeable in the 3D simulation of the garment, while the shape remains close to the original design. See also Fig. 3. The mismatch at each seam edge is visualized on a color scale from green (0 cm) to red (2 cm).

abstract

Despite recent developments towards on-demand, individualized garment design and fabrication, the majority of processes in the fashion industry are still inefficient and heavily dependent on manual work. A significant amount of recent research in this area has been focused on supporting designers to digitally create sewing patterns and shapes, but there is little work on textured fabrics. Aligning textile patterns like stripes or plaid along garment seams requires an experienced tailor and is thus reserved only for expensive, high-end garments. We present an interactive algorithm for automatically aligning repetitive textile patterns along seams for a given garment, allowing a user to make design choices at each step of our pipeline. Our approach is based on the 17 wallpaper groups and the symmetries they exhibit. We exploit these symmetries to optimize the alignment of the sewing pattern with the textured fabric for each of its pieces, determining where to cut the fabric. We optionally alter the sewing pattern slightly for a perfect fit along seams, without visibly changing the 3D shape of the garment. The pieces can then be cut automatically by a CNC or laser cutter. Our approach fits within the pipeline of digital garment design, eliminating the difficult, manual step of aligning and cutting the garment pieces by hand.

downloads

accompanying video

acknowledgments

We are grateful to Michael Rabinovich, Oliver Glauser, Christian Schüller, Shihao Wu and Alex Ion for invaluable discussions and help with the video, Rafael Wampfler for shirt examples and Magenta Zeng for textured cloth swatches. We thank Igarashi Lab for hosting the first author’s visit while working on this project.